GB/T 47917-2026
300mm硅外延片
300 mm silicon epitaxial wafers
- 实施日期
- 2027-02-01
- ICS 分类
- 29.045
组合使用关键词、标准类型、状态与 ICS 分类,快速定位所需国家标准。
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GB/T 47917-2026
300 mm silicon epitaxial wafers
GB/T 47902-2026
Polished single-crystal diamond wafers
GB/T 47901-2026
Gallium arsenide substrates for laser epitaxial chips
GB/T 47404-2026
Monocrystalline silicon carbide
GB/T 26071-2026
Monocrystalline silicon and wafers for solar cells
GB/T 35305-2026
Gallium arsenide monocrystalline and monocrystalline polished wafers for solar cell
GB/T 47097-2026
Polished monocrystalline aluminum nitride wafers
GB/T 35307-2023
GB/T 12963-2022
GB/T 30858-2025
Polished mono-crystalline sapphire substrate wafer
GB/T 30856-2025
GaAs substrates for LED epitaxial chips
GB/T 25074-2025
Solar-grade polycrystalline silicon
GB/T 44334-2024
Silicon epitaxial wafers with buried layers
GB/T 14264-2024
Terminology of semiconductor materials
GB/T 43885-2024
Silicon carbide epitaxial wafers
GB/T 43662-2024
Patterned sapphire substrate
GB/T 43612-2023
Collection of metallographs on defects in silicon carbide crystal materials
GB/T 35307-2023
Granular polysilicon produced by fluidized bed method
GB/T 30652-2023
Trichlorosilane for silicon epitaxial
GB/T 30656-2023
Polished monocrystalline silicon carbide wafers